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New Work Item Proposal - 47F-576 ED1: Semiconductor devices – Micro- electromechanical devices – Part 68: Test methods for magnetostriction coefficient of MEMS magnetic thin films

Source:
IEC
Committee:
EPL/47 - Semiconductors
Categories:
Information management | Standardization. General rules
Comment period start date:
Comment period end date:

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Scope

This part of IEC 62047 specifies test methods for magnetostriction coefficient of MEMS magnetic thin films. It applies to magnetic thin films, typically ranging from several nanometres to several tens of micrometres in thickness, that are formed on substrates or micromechanical structures.

Purpose

This document is proposed to be developed as an International Standard specifying test methods for determining the magnetostriction coefficient of magnetic films used in MEMS. By harmonizing the test scope, terminology, sample preparation, test apparatus and procedures, and data analysis methods, it will enable accurate measurement and comparable evaluation of the magnetostriction behaviour of magnetic films. The development of this standard will address the lack of consistency in test results across laboratories and organizations and will provide reliable parameters for microsystem design and quality control. It will also promote mutual recognition within the industry and international cooperation, reduce the cost of repeated testing, and support research and production of magnetic thin films, thereby facilitating their application in micro-sensors, micro-actuators and energy harvesters.

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