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Standards Development
This document uses ellipsometric measurements and their analysis to specify the method for the determination of the layer thickness d of a semi-transparent layer and for the determination of the optical (refractive index n and extinction coefficient k) or dielectric (real part 1 and imaginary part 2) constants/functions based on the semi-transparent single layer model.
Ellipsometry is well-established as in-situ and ex-situ technique in semiconductor industry for the measurement of layer thickness and optical constants simultaneously on sufficiently smooth and welldefined materials. There is a great potential of ellipsometry for various other industrial branches as display techniques and photovoltaics already proven to some extent. In R&D, there is an almost unlimited range of other applications, such as nanotechnology, thin film technology in optics and otherwise, materials and surface design, biomedicine and soft matter, electrochemistry, 2D-materials, and anisotropic materials. However, the application of ellipsometry to industrial branches other than semiconductor electronics is still limited. This is due to ellipsometry being a model-based technology requiring a fit algorithm to produce significant data. Technical surfaces are often non-ideal and need special validation procedures for measurement and modelling to achieve quantitative results with reliable uncertainty. The lack of standards outside semiconductor industry is a further significant obstacle for the dissemination and implementation of ellipsometry to quality control in other industrial fields and accredited testing labs (ISO/IEC 17025). The ongoing standardisation project with the goal to amend this situation started as a national initiative in Germany and aims at establishing a series of standards defining the method ellipsometry and its properties and to describe different complexity classes of samples and a standard strategy for solving them respectively as a model. Until now, ISO 23131 Ellipsometry – Principles, ISO 23131-2 Ellipsometry – Part 2: Bulk material model, and ISO 23131-3, Ellipsometry. Transparent single layer model have been published. These represent the analysis methods suitable only to very simple and idealised samples. This new draft will expand these concepts to at least partially absorbing layer materials. Therefore it is a necessary addition to the already existing standards on ellipsometry.
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