Standards Development
This standard describes a quantitative method for determining nanometre-scale roughness using atomic force microscopy. It describes procedures for quantitatively determining actual roughness using multiple probes with different tip curvatures. This method targets the roughness ranging from ca 100 pm to 50 nm, which can be measured with conventional probes commonly used in atomic force microscopes. It also describes how the lower measurement limit is determined due to instrument noise.
Surface roughness is an essential indicator in numerous industrial fields, including semiconductor manufacturing processes, optical elements, and precision machine parts. Surface roughness measurements have traditionally been performed at a fixed resolution. Although the definition of surface roughness follows existing ISO standards, variations in probe shape have long been a source of uncertainty in atomic force microscope measurements. This standard describes a procedure for using two or more probe types to correct for probe-related differences and convert the results to actual surface roughness or to a specific probe diameter. This will enable quantitative comparison of surface roughness below 1 nm rms, enabling quantitative evaluation of thin film surfaces, optical components, precision machine parts, and more. This is expected to improve the reliability of nano-roughness measurements using atomic force microscopes and expand their application.
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