British Standards Institution

Source:: IEC
Committee:: EPL/47 - Semiconductors
Categories:: Semiconductor devices. General
Comment period start date:: 26/08/2025
Comment period end date:: 15/10/2025
Number of comments:: 0

Comment by:

15th Oct

Scope

This part of IEC xxxxx provides guidance on the use of optical inspection for detecting nano-scale defects on commercially available wafers using ultraviolet (UV) light. Additionally, this document describes wafer defects detected by UV inspection techniques and various other surface characterization methods.

The scope of this document applies to all types of wafers currently employed for semiconductor devices.

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Please email further comments to: debbie.stead@bsigroup.com

Standard timeline

1. Proposal (Complete)

Proposal start date:

2. Draft (Complete)

Draft start date:

21/11/2025

3. Public Comments

Public Comments start date:

26/08/2025

Public Comments end date:

15/10/2025

Learn more about the standards development process

Standards Development

BS EN 63567-3 Ed.1.0 Semiconductor devices - Performance evaluation of semiconductor processing components and inspection equipment. Part 3: Nano-scale wafer surface inspection method using UV light

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