If you have difficulty in submitting comments on draft standards you can use a commenting template and email it to admin.start@bsigroup.com. The commenting template can be found here.
Standards Development
This part of IEC 63567-1 proposes a method of measuring the transmittance of extreme ultraviolet (EUV) pellicle used for extreme ultraviolet lithography (EUVL) and provides guidelines on the conditions of the transmittance measurement instrument using EUV with a short wavelength and methods for calculating EUV transmittance.
The scope of this document applies to all types of membranes attached to the front side of a reflective mask (or reflective reticle) used in EUVL to physically protect the reflective mask from contaminant particles generated inside the chamber during EUV exposure.
You are now following this standard. Weekly digest emails will be sent to update you on the following activities:
You can manage your follow preferences from your Account. Please check your mailbox junk folder if you don't receive the weekly email.
You have successfully unsubscribed from weekly updates for this standard.
Comment on proposal
Required form fields are indicated by an asterisk (*) character.